Posted Date : May 27,2021
Product (RFP/RFQ/RFI/Solicitation/Tender/Bid Etc.) ID : UNCT-23196
Government Authority located in Fayetteville, Arkansas; USA based organization looking for expert vendor for direct write lithography system.
[A] Budget: Looking for Proposal
[B] Scope of Service:
Vendor needs to provide direct write lithography system for a standalone fully integrated, sub-micron direct write lithography system for general purpose,
- fabrication facilities are growing and looking to add a direct write lithography capability to help better facilitate student work and faculty research,
- The size and quality of machine is based on an interest in sub-micron resolution across a 150mm square area utilizing various resist chemistries,
- With the multitude of substrate size and resist chemistries in use at the facility, this standalone fully integrated sub-micron direct write lithography system will need to provide flexibility in exposure area (up to 150mm x 150 mm2) and wavelength sensitivity to pattern photosensitive materials ranging from 365nm to 390nm, etc. to the government authority located in Fayetteville, AR.
[C] Eligibility:
Onshore (USA Only);
[D] Work Performance:
Performance of the work will be Offsite. Vendor needs to carry work in their office location.
Budget :
Deadline to Submit Proposals: June 08,2021
Cost to Download This RFP/RFQ/RFI/Solicitation/Tender/Bid Document : 5 US$
![]()
Product (RFP/RFQ/RFI/Solicitation/Tender/Bid Etc.) ID : UNCT-23196
Government Authority located in Fayetteville, Arkansas; USA based organization looking for expert vendor for direct write lithography system.
[A] Budget: Looking for Proposal
[B] Scope of Service:
Vendor needs to provide direct write lithography system for a standalone fully integrated, sub-micron direct write lithography system for general purpose,
- fabrication facilities are growing and looking to add a direct write lithography capability to help better facilitate student work and faculty research,
- The size and quality of machine is based on an interest in sub-micron resolution across a 150mm square area utilizing various resist chemistries,
- With the multitude of substrate size and resist chemistries in use at the facility, this standalone fully integrated sub-micron direct write lithography system will need to provide flexibility in exposure area (up to 150mm x 150 mm2) and wavelength sensitivity to pattern photosensitive materials ranging from 365nm to 390nm, etc. to the government authority located in Fayetteville, AR.
[C] Eligibility:
Onshore (USA Only);
[D] Work Performance:
Performance of the work will be Offsite. Vendor needs to carry work in their office location.
Budget :
Deadline to Submit Proposals: June 08,2021
Cost to Download This RFP/RFQ/RFI/Solicitation/Tender/Bid Document : 5 US$